Plasma-processing-induced Damage Of Thin Dielectric Films

für 61.20€ kaufen ··· 9783843387583 ··· 10361102415 ···
In semiconductor industry, material property degradation due to process is a critical factor that limits the device performance. Process-induced damage on a variety of dielectric materials is discussed and measured. Results from various metrologies are packaged and correlated into systematic theory. Charge-induced, chemical, and physical damage source in plasma process environment is identified and optimized. Two sample types of dielectrics are investigated: high-k dielectrics used in device technology and low-k dielectrics as observed in interconnect technology.
Hersteller: LAP Lambert Academic Publishing
Marke: LAP Lambert Academic Publishing
EAN: 9783843387583
Kat: Hardcover/Naturwissenschaften, Medizin, Informatik, Technik/Technik
Lieferzeit: Sofort lieferbar
Versandkosten: Ab 20¤ Versandkostenfrei in Deutschland
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5: Ab 20¤ Versandkostenfrei in Deutschland
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:::: Hardcover/Naturwissenschaften, Medizin, Informatik, Technik/Technik

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···· aufgenommen: 09.10.2020 · 00:58:33
···· & überprüft: 12.11.2020 · 21:11:29

: Plasma : processing : induced : Damage : Dielectric :

Plasma-processing-induced Damage Of Thin Dielectric Films

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