Plasma-processing-induced Damage Of Thin Dielectric Films
für 61.20€ kaufen ··· 9783843387583 ··· 10361102415 ··· In semiconductor industry, material property degradation due to process is a critical factor that limits the device performance. Process-induced damage on a variety of dielectric materials is discussed and measured. Results from various metrologies are packaged and correlated into systematic theory. Charge-induced, chemical, and physical damage source in plasma process environment is identified and optimized. Two sample types of dielectrics are investigated: high-k dielectrics used in device technology and low-k dielectrics as observed in interconnect technology. Hersteller: LAP Lambert Academic Publishing Marke: LAP Lambert Academic Publishing EAN: 9783843387583 Kat: Hardcover/Naturwissenschaften, Medizin, Informatik, Technik/Technik Lieferzeit: Sofort lieferbar Versandkosten: Ab 20¤ Versandkostenfrei in Deutschland Icon: https://www.inforius-bilder.de/bild/?I=2%2FospLSHPsdZXw4pIZ0K7UN%2FpC8rFSUYKR6oVXJgZZI%3D Bild: